Berlin 2018 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 19: Lithography I: Focused Electron Beam Induced Processing: 3D Nano-Printing for Material Science (Focussed Session): Morning Session (joint session DS/KFM)
DS 19.9: Vortrag
Mittwoch, 14. März 2018, 12:45–13:00, H 2032
Correlative in-situ characterization of 3D nanostructures by combining SEM and AFM — •Christian Schwalb1, Marcel Winhold1, Pinar Frank1, Stefan Hummel1, Roland Sachser2, Michael Huth2, Jürgen Sattelkow3, and Harald Plank3 — 1GETec Microscopy GmbH, Vienna, Austria — 2Physikalisches Institut, Goethe University Frankfurt, Germany — 3FELMI, Graz, Austria
Focused electron-beam-induced processing represents one of the most flexible approaches for functional nanostructure fabrication. During and after the growth process, e.g., electrical in-situ measurements as well as energy-dispersive X-ray spectroscopy are commonly employed to characterize electrical and chemical properties of fabricated structures. However, one major drawback is the lack of further in-situ analysis tools which grants access to real 3D topographic information, laterally resolved conductance maps, local magnetic or mechanical properties. We present a novel AFM that allows correlative in-situ analysis by combining the full SEM and AFM capability. The AFM measurement takes place in the field of view of the electron beam and thus allows for non-destructive and non-contaminating analyses of FEBID structures directly after fabrication. We make use of novel self-sensing cantilevers that are equipped with different specialized tips fabricated by 3D nano-printing of sharp purified metallic or magnetic tips. We present correlative in-situ conductive, magnetic and mechanical analysis of 3D nanostructures using these novel cantilever tips and discuss future applications.