Berlin 2018 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 23: Lithography II: Focused Electron Beam Induced Processing: 3D Nano-Printing for Material Science (Focussed Session): Afternoon Session (joint session DS/KFM)
DS 23.4: Vortrag
Mittwoch, 14. März 2018, 15:45–16:00, H 2032
Tuning and in-situ monitoring the hall resistance of ferromagnetic FEBID structures — •Roland Sachser and Michael Huth — Physikalisches Institut, Goethe-University, Frankfurt am Main, Germany
HFeCo3(CO)12 is an excellent FEBID precursor, which allows the deposition of magnetic and metallic CoFe alloy nanostructures. In contrast, the widely used (CH3)3CH3C5H4Pt standard precursor results in insulating deposits, consisting of Pt nanograins embedded in a carbonaceous matrix. In this contribution we will present measurements on samples prepared via co-deposition of both precursors. Varying the deposition conditions, the metal content of the deposits, and thus, the resistivity and the Hall resistance of the samples can be tuned. Furthermore, the co-deposited samples are sensitive to post-growth electron beam irradiation, which influences its electrical transport properties, as it is already known for normal FEBID deposits obtained by the Pt-precursor. We will show in-situ measurements of the Hall resistance directly inside the SEM by using the magnetic field provided by the immersion lens of the instrument. Further characterization is done via temperature-dependent electrical and magnetotransport measurements.