Berlin 2018 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 29: Lithography III: Lithography and Structuring (joint session KFM/DS)
DS 29.1: Hauptvortrag
Donnerstag, 15. März 2018, 09:30–10:00, EMH 025
3D Nanoprinting via Focused Electron Beams — •Harald Plank1,2, Robert Winkler1,2, Jason Fowlkes3,4, and Philip Rack3,4 — 1Institute for Electron Microscopy and Nanoanalysis Graz University of Technology, 8010 Graz, Austria — 2Graz Centre for Electron Microscopy, 8010 Graz, Austria — 3Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, USA — 4Department of Materials Science and Engineering, University of Tennessee, Knoxville, Tennessee 37996, USA
3D-printing of functional structures has emerged to an important technology in research and development. While being reliable on the micro and sub-micron scale, it becomes very challenging when aiming for nano-sized geometries. Among the very few direct-write techniques on that scale, Focused Electron Beam Induced Deposition is one of the promising candidates as this technology has recently done tremendous steps forward. In particular, this technology allows additive fabrication of complex, freestanding 3D nano-architectures on almost any material and surface morphology, which enables entirely new 3D nano-applications (e.g. plasmonics, artificial spin-ice or nano-probes). The contribution starts with an introduction of FEBID and sheds light on recent progress, which leverages this technology from a scientifically oriented fabrication tool into the status of a reliable and predictable 3D-nanoprinter. In the following, several applications are discussed to demonstrate the new possibilities of this generic fabrication technology. Finally, the talk gives an overview of ongoing activities together with future perspectives beyond current limitations.