Berlin 2018 – scientific programme

Parts | Days | Selection | Search | Updates | Downloads | Help

DS: Fachverband Dünne Schichten

DS 29: Lithography III: Lithography and Structuring (joint session KFM/DS)

DS 29.5: Invited Talk

Thursday, March 15, 2018, 11:20–11:50, EMH 025

Diffractive X-ray Optics for Synchrotrons and Free Electron Lasers - a challenge from the lithographer's point of view — •Christian David — Paul Scherrer Institut, Villigen, Switzerland

X-rays are excellent probes for the investigation of matter using scattering, imaging and spectroscopic techniques, offering high penetration capability, spatial and temporal resolution, along with elemental and chemical sensitivity. Accelerator-based photon sources play a key role in these analytical techniques as they offer beams with unique brilliance.

This presentation will give an overview on developments of x-ray instrumentation and experimental techniques based on diffractive optics. These optical elements are designed for short wavelength radiation ranging from the vacuum ultraviolet to hard x-rays and play a key role in the shaping, direction, and detection for a variety of experiments. The key challenges lie in the fabrication of the diffractive structures by advanced nanolithography techniques, as they need to provide dimensions and placement accuracies down to the nanometer scale.

Many applications of these devices include x-ray imaging techniques. The x-ray optics developed at PSI provide spatial resolution down to the 10 nm range, and are designed exploit phase contrast mechanisms or spectroscopic information. Moreover, recent developments of optics for beam splitting and the manipulation of x-ray wave fronts open up new opportunities for time resolved measurements of ultra-fast processes at x-ray lasers.