Berlin 2018 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 29: Lithography III: Lithography and Structuring (joint session KFM/DS)

DS 29.8: Vortrag

Donnerstag, 15. März 2018, 12:30–12:50, EMH 025

Printing Uniform Periodic Structures over Large Areas with Displacement Talbot Lithography — •Harun Solak — EULITHA AG, 5416 Kirchdorf, Switzerland

High-resolution periodic patterns such as linear gratings or two-dimensional arrays are required in many applications. This is especially true in photonics, where optimized interaction of light with periodic nanostructures enables creation of new or higher performance devices such as LEDs, lasers, photovoltaic cells, sensors and LCD screens. In such applications, patterns with periodicity approximately in the 0.1-1micrometer-range need to be printed on device surfaces. Current lithographic methods face significant challenges in terms of technical feasibility or cost in meeting the requirements. The recently introduced Displacement Talbot Lithography (DTL) method allows uniform printing of periodic patterns in a non-contact, proximity scheme [1]. The technique enables patterning on non-flat surfaces and in thick photoresist films up to the highest resolution possible at a given exposure wavelength. Photolithography systems specially designed to perform DTL exposures are now available and they find increasing use in various academic and industrial applications [2-3]. The capabilities of this new tool will be introduced with examples of applications. 1. H. Solak, C. Dais, F. Clube, Optics Express, Vol. 19, p. 10866 (2011). 2. H. Le-The, et al, Adv. Mater. Technol. 2017, 2, 1600238. 3. P. M. Coulon, et al Phys. Status Solidi B, 1700445.