Berlin 2018 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 35: Lithography IV: Lithography and Structuring (joint session KFM/DS)
DS 35.6: Vortrag
Donnerstag, 15. März 2018, 17:10–17:30, EMH 025
Fresnel-Mirror-Setup for Interference Lithography — •Arrigo Facchini1, Bodo Fuhrmann2, Hartmut S. Leipner2, Georg Schmidt1,2, and Roland Scheer1 — 1Martin Luther University Halle-Wittenberg Institute of Physics, D-06099 Halle (Saale), Germany — 2Martin Luther University Halle-Wittenberg Interdisciplinary Center of Materials Sciences, D-06099 Halle (Saale), Germany
Interference lithography is one of many alternative lithography techniques for the fast fabrication of large area regular nano- and micro-scale patterns. A variety of more or less complex setups using Lloyd*s interferometers or beam splitters are described in literature.
In particular, rigid Lloyd*s interferometer setups allow the fast change of the periodicity by simply changing the angle of incidence. They have, however, the drawback that for smaller angles of incidence (larger periodicity) the illuminated area decreases and as a consequence also the possible sample size.
Here a robust Fresnel mirror setup is presented, which overcomes this problem and allows the fast fabrication of regular patterns in the *m-range with freely selectable periodicity. The maximum sample size is only determined by the setup chosen.