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DS: Fachverband Dünne Schichten
DS 6: Thin Film Applications
DS 6.8: Vortrag
Montag, 12. März 2018, 17:00–17:15, H 0111
Large-scale self-assembling of nanostructures by controlled dewetting of ultra-thin silicon films on insulators — •Marco Salvalaglio1, Rainer Backofen1, Meher Naffouti2,3, Thomas Bottein2, Mario Lodari4, Thomas David2, Abdelmalek Benkouider2, Ibtissem Fraj3, Luc Favre2, Antioine Ronda2, Isabelle Berbezier2, David Grosso2, Marco Abbarchi2, Monica Bollani4, and Axel Voigt1 — 1TU-Dresden, 01062 Dresden, DE — 2CNRS - IM2NP, 13397 Marseille, FR — 3Université de Monastir, 5019 Monastir, TN — 4IFN-CNR, L-NESS, 22100 Como, IT
Thin solid films are rarely stable when annealed even below their melting temperature. Under the action of surface diffusion, atoms move away from the edges of thin films leading to their retraction and breaking. This process occurs in ultra-thin silicon films on insulator (UT-SOI), limiting their applications in several microsystems. Moreover, the self-assembled structures forming at the end of the process show too large randomness in positioning and size dispersion to be exploited for targeted applications. Here, thanks to a synergistic theoretical and experimental investigation, we illustrate a method to control the dewetting of UT-SOI, delivering nanostructures with determined positions, sizes and shapes [1]. 3D phase-field (PF) simulations, accounting for surface diffusion-limited kinetics, are adopted to enlighten the mechanism underlying the process and assess the outcomes of experiments. Indeed, we demonstrate that a fine control over the final structures is achieved when combining patches with an ad hoc initial patterning of the thin film. [1] M. Naffouti et al., Science Adv. 3, eaao1472 (2017).