Berlin 2018 – scientific programme

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DY: Fachverband Dynamik und Statistische Physik

DY 9: Statistical Physics far from Thermal Equilibrium

DY 9.12: Talk

Monday, March 12, 2018, 13:00–13:15, BH-N 334

Localized Deposition - Controlling cluster growth far from thermal equilibrium — •Thomas Martynec, Benedikt Hartung, and Sabine H.L. Klapp — Institut für Theoretische Physik, Technische Universität Berlin, Berlin, Germany

Thin-film growth by means of molecular beam epitaxy (MBE) is a typical example of non-equilibrium growth and a powerful method to produce devices for various technological applications [1-2]. Initially, particles are deposited at constant rate F on an empty lattice where these monomers freely diffuse until they meet other free particles on the lattice to form clusters. Nucleation events are randomly distributed on the lattice and one can only control the number of nucleation events (by varying temperature T and adsorption rate F) but not the location. This can be circumvented by using a stencil (or shadow) mask of linear size l [3-4]. Varying the size l, the particle flux F and the temperature T allows to spatially control nucleation events and the shape of clusters. We perform kinetic Monte-Carlo (KMC) simulations with spatially localized flux and identify three different growth modes that also emerge in experiments [4-5].
[1] S. Liu et al., npj 2D Materials and Applications 1, 30 (2017)
[2] Parkes et al., Sci Rep. 3, 2220 (2013)
[3] H. Yun et al., Sci Rep. 5, 10220 (2015)
[4] P. Fesenko et al., Cryst. Growth Des. 16, 4694 (2016)
[5] T. Martynec, B. Hartung, and S. H. L. Klapp, in preparation