Berlin 2018 – wissenschaftliches Programm

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HL: Fachverband Halbleiterphysik

HL 24: Poster Session II

HL 24.25: Poster

Dienstag, 13. März 2018, 18:30–20:30, Poster F

Resistance profiling along tapered nanowires: Multi-tip-technique vs. transmission line method — •Andreas Nägelein¹, Lisa Liborius², Matthias Steidl¹, Christian Blumberg², Peter Kleinschmidt¹, Artur Poloczek², and Thomas Hannappel¹ — ¹TU Ilmenau, Ilmenau, Germany — ²University Duisburg-Essen, Duisburg, Germany

The advantageous properties of nanowire (NW) structures for electronic or optoelectronic devices are well-established. However, precise control of the dopant distribution within the NWs is difficult to obtain and its determination is challenging. Here, the transmission line measurement (TLM) method provides an access via the electrical transport properties, but its spatial resolution is limited and it cannot be applied to as-grown NWs. In contrast, a multi-tip scanning tunneling microscope (MT-STM), with its independently moveable tips, enables the in-system measurement of continuous axial resistance profiles and avoids the necessity of ex-situ deposition of ohmic contacts. In this paper, a comparative analysis of NW resistance profiling is presented. NWs from the very same sample were first measured and evaluated by MT-STM and then detached and transferred to a non-conducting substrate where TLM measurements were performed. Here, tapering of the measured NWs complicates the evaluation of the TLM data. A new model and correction factors were introduced to determine specific resistances and transfer length. We found an agreement of the measured data of both methods and demonstrate the accuracy and the superior resolution of the MT-STM method.