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Berlin 2018 – scientific programme

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HL: Fachverband Halbleiterphysik

HL 30: Heterostructures, interfaces, and surfaces

Wednesday, March 14, 2018, 15:00–17:30, EW 202

15:00 HL 30.1 Band offset of Ga(N,As,P)/GaP heterostructures on silicon for optoelectronic integration — •Sebastian Gies, Florian Dobener, Robin C. Döring, Sarah Karrenberg, Khakaber Jandieri, Peter Ludewig, Kerstin Volz, Wolfgang Stolz, Sangam Chatterjee, and Wolfram Heimbrodt
15:15 HL 30.2 First Principle Calculations of Interlayer Electronic Excitations in MoS2-WS2-MoSe2 van der Waals Trilayer Semiconductor — •Anders Christian Riis-Jensen and Kristian Sommer Thygesen
15:30 HL 30.3 Hole carrier profiles at the surface of p-type Ge measured by low-energy muon spin spectroscopy — •Thomas Prokscha, Kim Chow, Elvezio Morenzoni, Zaher Salman, Evelyn Stilp, and Andreas Suter
15:45 HL 30.4 NiSi2-Si interfaces and their role in tunneling based field-effect transistors: from the atomic structure to device characteristics — •Florian Fuchs, Sibylle Gemming, and Jörg Schuster
16:00 HL 30.5 Spectroscopic examination and theoretical modelling of fluorescence spectral diffusion of CdSe/CdS dotrods — •Sven-Hendrik Lohmann, Philip Harder, Felix Bourier, Christian Strelow, Tobias Kipp, and Alf Mews
  16:15 15 min. break.
16:30 HL 30.6 Fluorescence behaviour of semiconductor nanoparticles in vicinity of plasmonic metals — •Simon Schneider, Phillip Witthöft, Jannik Rebmann, Tobias Kipp, Christian Strelow, and Alf Mews
16:45 HL 30.7 Tracing dark exciton dynamics with optical bistable exciton polaritons in planar microcavities — •Daniel Schmidt, Bernd Berger, Manfred Bayer, Christian Schneider, Sven Höfling, and Marc Aßmann
17:00 HL 30.8 Exceptional Carrier Diffusion on CdTe Surfaces Revealed by 4D Electron Microscopy — •Ahmed M. El-Zohry, Basamat S. Shaheen, Jun Yin, Boon Ooi, Osman M. Bakr, and Omar F. Mohammed
17:15 HL 30.9 Template-Assisted Fabrications of Regular Arrays of Nanostructures for Sensitive Gas-Sensing — •Shipu Xu, Huaping Zhao, Yang Xu, Rui Xu, Huanming Zhang, and Long Liu
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