Berlin 2018 – wissenschaftliches Programm

Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe

KFM: Fachverband Kristalline Festkörper und deren Mikrostruktur

KFM 23: Lithography III: Lithography and Structuring (joint session KFM/DS)

Donnerstag, 15. März 2018, 09:30–12:50, EMH 025

While high-resolution 2D lithography and structuring is relatively mature and also widely applied in industrial processes, work on its 3D variant is mostly focusing on fundamental aspects and process development. At the lower edge of possible 3D feature dimensions, certainly methods such as electron beam induced deposition, non-linear multi-photon-laser lithography and thermal scanning probe lithography techniques are required. This session discusses most of these dedicated 3D methods in detail. For the fabrication of complex 2D and 2.5D patterns, advanced electron beam and X-ray methods are continuously developed further. In addition, new methods such as high resolution Talbot lithography for relatively large areas are already entering industrial maturity. This session also discusses some of the latest developments in this field of binary lithography.

Organizer: Robert Kirchner - Technische Universität Dresden

	09:30	KFM 23.1	Hauptvortrag: 3D Nanoprinting via Focused Electron Beams — •Harald Plank, Robert Winkler, Jason Fowlkes, and Philip Rack
	10:00	KFM 23.2	3D printing at the diffraction limit: sample injection for time-resolved serial crystallography — •Michael Heymann
	10:20	KFM 23.3	Fabrication of superior 2D and 3D nano-devices using NanoFrazor lithography — Colin Rawlings, Armin Knoll, Felix Holzner, and •Zhengming Wu
	10:40	KFM 23.4	Innovations in photoresists and photopolymers for 2D / 3D micro and nano fabrication — •Anja Voigt, Christine Schuster, Jan Klein, Arne Schleunitz, and Gabi Grützner
	11:00		20 min. break
	11:20	KFM 23.5	Hauptvortrag: Diffractive X-ray Optics for Synchrotrons and Free Electron Lasers - a challenge from the lithographer's point of view — •Christian David
	11:50	KFM 23.6	A high contrast multilayer process for electron beam lithography using different developers — •Philip Trempler, Frank Heyroth, Matthias Schirmer, Christian Kaiser, Tobias Mai, and Georg Schmidt
	12:10	KFM 23.7	Fabrication of metal nanostructures with focused X-rays — •Andreas Späth, Florian Vollnhals, Fan Tu, Hubertus Marbach, and Rainer H. Fink
	12:30	KFM 23.8	Printing Uniform Periodic Structures over Large Areas with Displacement Talbot Lithography — •Harun Solak