Berlin 2018 – wissenschaftliches Programm
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MA: Fachverband Magnetismus
MA 21: Poster I
MA 21.77: Poster
Dienstag, 13. März 2018, 09:30–13:00, Poster A
Application of 3D Lithography — •Christian Denker1, Cornelius Fendler2, Julia Bethune4, Nina Meyer1, Tobias Tubandt1, Finn-F. Lietzow1, Neha Jha1, Chris Badenhorst3, Alena Rong5, Jakob Walowski1, Mark Doerr3, Raghvendra Plankar4, Mihaela Delcea5, Uwe T. Bornscheuer3, Robert Blick2, Swadhin Mandal6, and Markus Münzenberg1 — 1Institut für Physik, Universität Greifswald, Germany — 2Institut für Nanostruktur- und Festkörperphysik, Universität Hamburg, Germany — 3Institut für Biochemie, Universität Greifswald, Germany — 4Institute of Immunology and Transfusion Medicine, University Medicine Greifswald, Germany — 5Centre for Innovation Competence - Humoral Immune Reactions in Cardiovascular Diseases, Universität Greifswald, Germany — 6Indian Institute of Science Education and Research Kolkata, India
3D 2-Photon-Lithography, originally developed for 3D photonic crystals, opens a wide range of new possible applications in many other fields, e.g. life sciences, micro-optics and mechanics [1].
We will present our recent applications of 3D 2-Photon-Lithography and show 3D evaporation masks for in-situ device fabrication using different deposition angles, infra-red laser light focusing lenses directly fabricated on optical fibers, tunnel structures for guiding growth of elongated cells, pillars for investigation of cell mechanics and master-mold fabrication for Polydimethylsiloxane (PDMS) micro-fluidic channels.
J. K. Hohmann et al., Adv. Optical Mater. 3 (2015) 1488