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Berlin 2018 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 43: Poster: Semiconductor Substrates - Adsorption

Dienstag, 13. März 2018, 18:15–20:30, Poster A

  18:15 O 43.1 The contribution has been withdrawn (duplicate of O 43.3).
  18:15 O 43.2 The contribution has been withdrawn (duplicate of O 43.3).
18:15 O 43.3 Preparation and Characterization of a Monolayer Thallium on Si(110) — •Pascal Grenz, Philipp Eickholt, Anke Beck-Schmidt, Koji Miyamoto, Kazuyuki Sakamoto, and Markus Donath
18:15 O 43.4 Hexacene generated by deoxygenation on passivated silicon — •Frank Eisenhut, Justus Krüger, Dmitry Skidin, Seddigheh Nikipar, José M. Alonso, Enrique Guitián, Dolores Pérez, Dmitry A. Ryndyk, Diego Peña, Gianaurelio Cuniberti, and Francesca Moresco
18:15 O 43.5 Cobalt-Pyrphyrin on Cu2O(111): A promising system for photocatalytic water splitting — •Lisa Grad, Fabio Cossalter, Wolf-D. Zabka, Stephan Schnidrig, Benjamin Probst, Roger Alberto, Zbynek Novotny, Matthias Hengsberger, and Jürg Osterwalder
  18:15 O 43.6 The contribution has been withdrawn.
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