Berlin 2018 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 49: Poster: Nanostructures on Surfaces I

O 49.26: Poster

Dienstag, 13. März 2018, 18:15–20:30, Poster A

Controlled soft-landing electrospray ion-beam deposition on freestanding graphene for high resolution transmission electron microscope characterization of molecules — •Suman Sen, Nilesh Vats, Stephan Rauschenbach, Sabine Abb, Wilfried Sigle, Marko Burghard, Peter van Aken, and Klaus Kern — Max Planck Institute for Solid State Research, Heisenbergstr.1, 70569 Stuttgart Germany

Electrospray ion-beam deposition (ES-IBD) has evolved as a pivotal technique for studying molecules in ultra-high vacuum (UHV) condition to attain single molecular resolution [1]. In this work, we deposited and learned about absorption properties of phosphotungstic acid (PTA) on single-layer graphene (SLG). We have demonstrated how large poly-oxo-metallate (POM) anions can be deposited in a controlled way with different landing energies on SLG in UHV. We showed that, PTA molecules have higher affinity to absorb onto amorphous impurity present on graphene compared to pristine SLG. Furthermore, atomic scale resolution of the PTA molecule absorbed on SLG using low-voltage (80 kV) aberration-corrected, high-resolution TEM was performed. Our study provides first detailed learning about the soft landing, absorption and characterization of individual POM anions on SLG. This can give insight into fabrication of two-dimensional materials involving graphene and POM species. [1] Rauschenbach, S. et al., Small, 2, 540-547, (2006)