Berlin 2018 – wissenschaftliches Programm

Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe

O: Fachverband Oberflächenphysik

O 58: 2D materials beyond graphene: TMDCs, silicene and relatives II

O 58.9: Vortrag

Mittwoch, 14. März 2018, 12:30–12:45, MA 043

Lateral heterostructures of two-dimensional materials by electron-beam induced stitching — •Andreas Winter¹, Antony George¹, Christof Neumann¹, Zian Tang¹, Michael Mohn², Johannes Biskupek², Nirul Masurkar³, Arava Reddy³, Thomas Weimann⁴, Uwe Hübner⁵, Ute Kaiser², and Andrey Turchanin¹ — ¹Institute of Physical Chemistry, Friedrich Schiller University Jena, 07743 Jena — ²Electron Microscopy Group of Materials Science, Ulm University, 89081 Ulm — ³Department of Mechanical Engineering, Wayne State University, 48202 Detroit, USA — ⁴Physikalisch-Technische Bundesanstalt, 38116 Braunschweig — ⁵Leibniz Institute of Photonic Technology, 07745 Jena

We present novel two-dimensional (2D) lateral heterostructures of graphene and MoS₂ sheets with molecular carbon nanomembranes (CNMs), synthesized by electron beam induced stitching. Graphene and MoS₂ were transferred onto gold substrates and lithographically patterned. Self-assembled monolayers (SAMs) of aromatic thiols were grown in the areas between the 2D materials. Irradiation with an electron beam converts the SAMs into CNMs and simultaneously stitches the CNM to graphene or MoS₂, forming a heterogeneous film of two different materials. These heterostructures are mechanically stable, enabling their preparation as freestanding sheets. We characterized them by means of Raman spectroscopy, atomic force microscopy (AFM), helium ion microscopy (HIM), X-ray photoelectron spectroscopy (XPS) and high resolution transmission electron microscopy (HRTEM) and find that they possess molecularly sharp boundaries.