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O: Fachverband Oberflächenphysik

O 59: Nanostructures at surfaces: 1D and 2D structures and networks I

O 59.10: Vortrag

Mittwoch, 14. März 2018, 12:45–13:00, MA 141

Large area nanopatterns in elastomers by nanosphere mask replication — •Julius Bürger¹, Katharina Brassat¹, Thorsten Meyers², Ulrich Hilleringmann², and Jörg K. N. Lindner¹ — ¹Paderborn University, Dept. of Physics, Paderborn, Germany — ²Paderborn University, Sensor Technology Dept., Paderborn, Germany

Soft lithography is a well-established low-cost surface patterning technique using structured elastomers for transferring large-scale patterns with nanometer-sized features. The biocompatible, optically transparent, highly flexible and isolating polydimethylsiloxane (PDMS) is a widely used elastomer which can be poured on a mold. After cross-linking it is released by a peel off, replicating the surface morphology of the mold. For the creation of a mold with nanoscale features, we exploit nanosphere lithography (NSL). In NSL a colloidal suspension forms a hexagonally close packed sphere mask on a substrate by self-organization. The sphere diameter can range from nanometers to several micrometers and post sphere deposition treatments of the masks such as plasma shrinking yield a huge diversity of possible masks. We use a monolayer of 618 nm polystyrene spheres on a silicon substrate as a mold to obtain stamps with replication of a hexagonal structure with elevated tips at initial interstices between the spheres. Aspect ratios of stamp features were optimized by adjusting the PDMS viscosity, by hydrophilisation of the substrate surface and by interlinking the spheres. We show a novel approach for tactile sensing with a transistor-based capacitive pressure sensor with promising characteristics for creation of an electronic skin.