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O: Fachverband Oberflächenphysik

O 59: Nanostructures at surfaces: 1D and 2D structures and networks I

O 59.1: Vortrag

Mittwoch, 14. März 2018, 10:30–10:45, MA 141

Physical Vapor Deposition at Oblique Angles — •Christoph Grüner, Susann Liedtke, and Bernd Rauschenbach — Leibniz Institute of Surface Engineering (IOM), Permoserstraße 15, D-04318 Leipzig, Germany

Physical vapor deposition at oblique angles is an often found circumstance in applied thin film deposition. Besides the geometric relation between material source and the substrate, the topography of the substrate as well as its curvature, shape and roughness locally lead to oblique deposition. Thin films deposited at oblique angles can show significant morphological differences compared to the vertically deposited counterparts. The formation of porous films, consisting of a large number of tilted columns is typically observed under non-normal deposition conditions. Deposition at highly oblique angles is also utilized to create separated nanostructures on surfaces. Techniques referring to this are known as oblique angle deposition (OAD) and glancing angle deposition (GLAD). Although these techniques have been used since the 1950s, a model that is able to adequately predict the properties of the obliquely grown films has not been found yet. In this contribution, a model is proposed, which allows predicting the density, growth speed and columnar tilt angle of obliquely deposited thin films for different materials over the complete angle of incidence range.