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K: Fachverband Kurzzeit- und angewandte Laserphysik

K 7: Internal Symposium Optic Coatings and Plasma Technology

K 7.1: Hauptvortrag

Donnerstag, 8. März 2018, 10:30–11:00, MB HS

A global model for radio frequency magnetron sputtering processes — •Dennis Engel, Laura Kroll, and Ralf Peter Brinkmann — Institute of Theoretical Electrical Engineering, Ruhr University Bochum, Germany

Magnetron sputtering is an established technology to deposit thin films on large substrates. Employing RF power (instead of the conventional DC power) allows to sputter not only electrically conductive materials but also dielectrics like optical coatings. This contribution presents a global model for such an RF driven magnetron which is an extension of a previously published lumped circuit description of unmagnetized RF discharges [1]. As its predecessor, the model represents the discharge by separate bulk and sheath zones which communicate via Kirchhoff relations. The extension accounts for the presence of a magnetized region with reduced electric conductivity [2,3]. The model evaluates quickly and may be used for the purpose of model based control.