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K: Fachverband Kurzzeit- und angewandte Laserphysik
K 7: Internal Symposium Optic Coatings and Plasma Technology
K 7.2: Hauptvortrag
Donnerstag, 8. März 2018, 11:00–11:30, MB HS
The Multipole Resonance Probe as a powerful diagnostic tool for industrial plasma processes — •Moritz Oberberg1, Stefan Ries1, Christian Wölfel2, Jens Harhausen3, Dennis Pohle4, Christian Schulz4, Oliver Schmidt5, Wladislaw Dobrygin5, Ilona Rolfes4, Ralf Peter Brinkmann6, and Peter Awakowicz1 — 1Lehrstuhl für Allgemeine Elektrotechnik und Plasmatechnik, Ruhr-Universität Bochum — 2Lehrstuhl für Automatisierungstechnik und Prozessinformatik, Ruhr-Universität Bochum — 3Leibniz Institut für Plasmaforschung und Technologie, INP Greifswald — 4Lehrstuhl für Hochfrequenzsysteme, Ruhr-Universität Bochum — 5Robert Bosch GmbH — 6Lehrstuhl für Theoretische Elektrotechnik, Ruhr-Universität Bochum
Based on the concept of active plasma resonance spectroscopy (APRS) the Multipole Resonance Probe (MRP) has been introduced as a diagnostic tool for electron density measurements. In recent years efforts in modeling, simulation, and experiments lead to advances in understanding and design of the MRP. In this contribution, its application in industrial processes such as sputtering and plasma ion assisted deposition (PIAD) is presented. The probe is insensitive against dielectric coatings and can be adapted as a highly functional and fast diagnostic system for such deposition processes, where other diagnostics, e. g. Langmuir probes, fail. It can be used for real-time process monitoring and has been tested in control loops to stabilize deposition processes. Further challenges for both academia and industry are addressed such as the temperature stability. Funded by BMBF (13N13212)