Erlangen 2018 – wissenschaftliches Programm
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K: Fachverband Kurzzeit- und angewandte Laserphysik
K 7: Internal Symposium Optic Coatings and Plasma Technology
K 7.3: Hauptvortrag
Donnerstag, 8. März 2018, 11:30–12:00, MB HS
Prospects for the enhancement of PIAD processes by monitoring of optical thickness and plasma parameters — •Jens Harhausen1, Rüdiger Foest1, Margarita Baeva1, Detlef Loffhagen1, Olaf Stenzel2, Steffen Wilbrandt2, Christian Franke2, Norbert Kaiser2, and Ralf Peter Brinkmann3 — 1Leibniz Institute for Plasma Science and Technology, Greifswald, Germany — 2Fraunhofer Institute of Applied Optics and Precision Engineering, Jena, Germany — 3Ruhr University, Institute of Theoretical Electrical Engineering, Bochum, Germany
Plasma ion assisted deposition (PIAD) is a common technique employed for the production of optical interference coatings. Present control schemes concerning the plasma state focus on parameters of the supply units, such as gas fluxes, or electrical quantities. In-situ data on the growing films are obtained by quartz crystal microbalance (QCM) and optical monitoring (OM). In order to access plasma parameters during the deposition process, we employ optical emission spectroscopy (OES) and active plasma resonance spectroscopy (APRS). Data on radiance by OES and electron density from APRS are used to develop novel schemes for plasma-based control. The impact of the control procedure on the reproducibility of layer properties is discussed based on results obtained for a quarterwave stack serving as test case. In particular, it is attempted to disentangle variations in the refractive index from OM data of constant optical thickness. Results presented in this contribution are based on funding by the German Federal Ministry of Education and Research under grant 13N13213.