Erlangen 2018 – scientific programme
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P: Fachverband Plasmaphysik
P 13: Low Pressure Plasmas - Poster
P 13.17: Poster
Tuesday, March 6, 2018, 16:15–18:15, Redoutensaal
Ellipsometric Analysis of Nanostructures in Thin SiO2-Films — •Rahel Buschhaus, Carles Corbella, and Achim von Keudell — Experimentalphysik II, Ruhr-Universität Bochum
Nanostructure of thin films plays an important role for their performance in barrier coating applications. Ellipsometric characterisation of surfaces constitutes a non-invasive analysis of the effect of plasma surface treatment. Plastic substrates such as polypropylene (PP) are of special interest for the packaging industry. PP is deposited by spin coating on silicon wafers. Silicon dioxide layers are deposited by means of pulsed microwave plasma on thin PP layers using a gas admixture of hexamethyldisiloxane (HMDSO) and oxygen. Afterwards, these layers are ion- and plasma etched in a particle beam experiment or an inductively coupled plasma (ICP) reactor, respectively. Optical properties of the barrier films are analysed during etching by spectroscopic ellipsometry to study film in-depth uniformity.
Ellipsometric porosimetry will be carried out with a modified spectroscopic ellipsometer at atmospheric pressure. The adsorption of solvents causes the change of refractive index, thereby gaining information about the pore size and pore distribution with the selection of the appropriate ellipsometric model.
The influence of the SiO2 deposition parameters on the porosity will be analysed.