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16:15 |
P 13.1 |
Electron Impact Excitation of Xenon — •Dirk Luggenhölscher, Uwe Czarnetzki, Oleg Zatsarinny, and Klaus Bartschat
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16:15 |
P 13.2 |
Spectroscopic investigations of the silyl radical using a quantum cascade laser — Andy S. C. Nave, Andrei V. Pipa, Paul B. Davies, Jürgen Röpcke, and •Jean-Pierre H. van Helden
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16:15 |
P 13.3 |
Diagnostics on a hollow cathode glow discharge by means of a retarding field analyser and a calorimetric probe — •Lisa Anna-Maria Bauer, Fabian Haase, Sven Gauter, and Holger Kersten
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16:15 |
P 13.4 |
Experimental studies of momentum transfer during sputtering with interferometric force probes — •Mathis Klette, Thomas Trottenberg, and Holger Kersten
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16:15 |
P 13.5 |
Quantum kinetic theory of ion-induced secondary electron emission from surfaces — Mathias Pamperin, •Franz Xaver Bronold, and Holger Fehske
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16:15 |
P 13.6 |
Untersuchungen zur Trichterkompression von Plasmen koaxialer Beschleuniger — •Thomas Manegold, Parysatis Tavana, Christian Benzing, Marcus Iberler und Joachim Jacoby
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16:15 |
P 13.7 |
Characterization of a portable measurement device for the determination of absolute VUV emission of low pressure plasmas — •Caecilia Fröhler, Roland Friedl, Stefan Briefi, and Ursel Fantz
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16:15 |
P 13.8 |
Protective coating for electronic assemblies against environmental influences - a high throughput low pressure plasma process for in-line integration — Fabian Utzmann, •Florian Eder, and Bastian J. M. Etzold
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16:15 |
P 13.9 |
Application of an AC method for measuring the EEDF in low pressure plasmas by a Langmuir probe — •Adrian Heiler, Roland Friedl, and Ursel Fantz
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16:15 |
P 13.10 |
Investigation of a low pressure microwave plasma source for high rate etching — •Steffen Riegger, Andreas Schulz, Matthias Walker, Günter Tovar, Mario Dünnbier, and Klaus Baumgärtner
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16:15 |
P 13.11 |
Plasma enhanced chemical vapour deposition and plasma etch challenges for technological fabrication of silicon nitride photonic components — •Erik Lehmann, Harald Richter, Mirko Fraschke, Marco Lisker, Thomas Grabolla, Lars Zimmermann, and Andreas Mai
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16:15 |
P 13.12 |
Structural Characterization of VOx deposited by Plasma Ion Assisted Electron Beam Evaporation for Energy Storage Application — •Miguel Dias, Anna Frank, Stefan Hieke, Simon Fleischmann, Jens Harhausen, Rüdiger Foest, Volker Presser, Christina Scheu, and Angela Kruth
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16:15 |
P 13.13 |
An optically trapped microparticle as a probe — •Viktor Schneider and Holger Kersten
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16:15 |
P 13.14 |
The contribution has been withdrawn.
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16:15 |
P 13.15 |
Production of a high-density plasma channel for laser acceleration — •Daiyu Hayashi und Tatsuo Shoji
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16:15 |
P 13.16 |
The contribution has been withdrawn.
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16:15 |
P 13.17 |
Ellipsometric Analysis of Nanostructures in Thin SiO2-Films — •Rahel Buschhaus, Carles Corbella, and Achim von Keudell
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