Erlangen 2018 – scientific programme

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P: Fachverband Plasmaphysik

P 16: Low Pressure Plasmas II

P 16.7: Talk

Wednesday, March 7, 2018, 15:45–16:00, KI 1.174

Deposition of SiO_x coatings by inductively coupled plasma: effect of pulsed hexamethyldisiloxan flow — •Markus Brochhagen¹, Sascha Chur¹, Vincent Layes¹, Marc Böke¹, and Jan Benedikt² — ¹Experimentalphysik II, Ruhr-Universität Bochum, Universitätsstraße 150, 44801 Bochum — ²Experimentelle Plasmaphysik, Christian-Albrechts-Universität zu Kiel, Leibnitzstr. 17, 24118 Kiel

SiO₂-like films are used for barrier coatings on polymeric substrates. The lower the amount of carbon inside the layer, the better is the barrier performance. Such layers can be produced in a plasma process using evaporated HMDSO and admixed Argon or Oxygen. In this work we report on a pulsed HMDSO flow allowing a direct post treatment of the films. The process is studied under high plasma density conditions in an ICP plasma with FTIR spectrometry and XPS. Additionally the thickness is measured with a profilometer. Analysis of carbon free films from O₂/HMDSO are presented and effects of the pulsed HMDSO flow mode are reported, as well as results for films from Ar/HMDSO plasma.

This work is supported by DFG within SFB-TR 87.