P 2: Low Pressure Plasmas I
Montag, 5. März 2018, 10:30–12:30, KI 1.174
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10:30 |
P 2.1 |
Hauptvortrag:
Key Features of Reactive High Power Impulse Magnetron Sputtering — •Daniel Lundin
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11:00 |
P 2.2 |
Probing the Electron Density of Spokes in a HiPIMS Plasma Using Target Inserts — Ante Hecimovic, •Julian Held, Volker Schulz-von der Gathen, Wolfgang Breilmann, Christian Maszl, and Achim von Keudell
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11:15 |
P 2.3 |
Correlation of current shape and surface poisoning in reactive high power impulse magnetron sputtering by means of X-ray photoelectron spectroscopy — •Sascha Monjé, Vincent Layes, Carles Corbella, Achim von Keudell, Teresa de los Arcos und Volker Schulz-von der Gathen
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11:30 |
P 2.4 |
Reactive magnetron sputtering of Ta-doped SnO2 polycrystalline films at low temperatures: carrier transport and role of negative ion bombardment — •Stefan Seeger, Klaus Ellmer, Rainald Mientus, and Michael Weise
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11:45 |
P 2.5 |
Modelling of chemical vapor deposition to improve tungsten fiber reinforced tungsten composites (Wf/W) — •L. Raumann, J.W. Coenen, J. Riesch, Y. Mao, H. Gietl, T. Höschen, C. Linsmeier, and O. Guillon
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12:00 |
P 2.6 |
Spectroscopic investigations of plasma nitrocarburizing processes with a mid-infrared frequency comb — Norbert Lang, Alexander D. F. Puth, Grzegorz Kowan, Stephan Hamann, Jürgen Röpcke, Piotr Masłowski, and •Jean-Pierre H. van Helden
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12:15 |
P 2.7 |
In-situ measurement of optical properties of metallic surfaces using the Doppler-shifted emission of fast neutral atoms in a low density plasma — •Sven Dickheuer, Oleksandr Marchuk, Christian Brandt, Andrei Goriaev, Mykola Ialovega, and PSI-2 Team
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