Erlangen 2018 – scientific programme

Parts | Days | Selection | Search | Updates | Downloads | Help

P: Fachverband Plasmaphysik

P 3: Plasma Wall Interactions I / Astrophysical Plasmas

P 3.2: Talk

Monday, March 5, 2018, 14:15–14:30, A 0.112

Characterization of a SnO2:Ta magnetron discharge by a multifunctional plasma and deposition sensor — Michael Weise¹, Stefan Seeger¹, Rainald Mientus¹, Karsten Harbauer², and •Klaus Ellmer¹ — ¹Optotransmitter-Umweltschutz-Technologie e.V., 12555 Berlin (Germany) — ²Helmholtz-Zentrum Berlin für Materialien und Energie, 14109 Berlin (Germany)

A multifunctional sensor (Welzel et al., Appl. Phys. Lett. 102 (2013) 211605), based on a conventional quartz crystal monitor (microbalance) for mass increase/decrease measurements, was used to measure quasi-simultaneously the deposition/etching flux, the energy flux and the charged particle flux in a magnetron discharge with a SnO2:Ta target. By moving the magnetron radially relative to the sensor, the lateral (radial) flux profiles of the 75 mm * magnetron were measured with a lateral resolution of about 8 mm, the diameter of the aperture in front of the quartz crystal. By combining the different measured quantities the ion-to-neutral ratio jion/jneutral and the mean energy per deposited atom were calculated, parameters that are essential for the characterization of plasma deposition and etch processes. These radial distributions were related to the optical and electrical properties of the transparent and conductive SnO2:Ta films, indicating a strong influence of the jion/jneutral ratio on the film resistivity.