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SYPT: Symposium Applications and New Trends of Plasmatechnology – An Overview

SYPT 1: Application and New Trends of Plasmatechnology - Part I

SYPT 1.4: Hauptvortrag

Donnerstag, 8. März 2018, 12:00–12:30, M 00.910

Compact discharge based plasmas as sources for soft x-ray and extreme ultraviolet radiation — •Klaus Bergmann — Fraunhofer Institute for Laser Technology ILT, 52074 Aachen

Discharge based plasmas offer a compact and cost effective choice for EUV- and soft x-ray radiation sources. During the last decades such sources experienced a rapid progress which is mainly driven by the request of the semiconductor industry for sources at a wavelength of 13.5 nm to be used in EUV lithography. At Fraunhofer ILT we are developing discharge sources, which are based on a pseudospark electrode geometry where the working gas is heated and compressed to high temperatures and densities using a pulsed current of typically 10 kA from the discharge of a low inductively connected storage capacity. These hot plasmas emit characteristic short wavelength radiation dependent on the used working gas, e.g. Xenon for 13.5 nm. This paper gives an overview on the recent progress for sources to be used either in x-ray microscopy or in the environment of EUV lithography at wavelengths of 2.9 nm and 13.5 nm, respectively. Scientific and engineering challenges on power and efficiency scaling will be addressed.