München 2019 – wissenschaftliches Programm

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P: Fachverband Plasmaphysik

P 3: Plasma Surface Interaction I

P 3.5: Vortrag

Montag, 18. März 2019, 12:30–12:45, HS 21

Decoupling of ion- and photon-activation mechanisms in polymer surfaces exposed to low-temperature plasmas — •Rahel Buschhaus¹, Maik Budde¹, Carles Corbella², and Achim von Keudell¹ — ¹Experimentalphysik II, Ruhr-Universität Bochum — ²Department of Mechanical and Aerospace Engineering, The George Washington University, Washington, USA

The treatment of polymers by plasmas and ion beams is a common technique to optimize surface properties e.g. regarding roughness. The impact of plasma components, namely ions, neutrals, electrons and photons, were analyzed separately to investigate synergistic effects. The elementary processes on surfaces are mimicked by sending quantified beams of ions and atoms to the polymers in an ultra-high vacuum reactor. Polypropylene (PP) and Polyethylene (PET)[1] layers, are exposed to argon ions (200eV, 500eV), which are extracted from an electron-cyclotron-resonance (ECR) plasma source. This ion beam is separated from the photons (UV and VUV) generated in the plasma volume by an ion beam deflector. Fourier transformed infrared spectroscopy (FTIR) is applied in situ for analyzing etching rate and chemical state of the surfaces. Etching measurements are performed with either Ar⁺ or Ar⁺ plus photons by removing the ion beam deflector. With a surface coverage model, we will describe the time dependency of etched thickness, calculate sputter yields and discuss the ion-and photon activation mechanisms. Additionally, reactive sputtering is mimicked by adding neutral oxygen beams to the Ar measurements. [1]M. Budde et al., Plasma Process Polym, 15(4):1700230(2018)