Regensburg 2019 – scientific programme
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BP: Fachverband Biologische Physik
BP 21: Biopolymers, biomaterials and bioinspired functional materials (joint session CPP/BP)
BP 21.8: Talk
Wednesday, April 3, 2019, 18:00–18:15, H13
Capabilities of photoresists based on polysaccharides for Direct LaserWriting — •Marie-Christin Heep1, Agnes Koerfer1, Maximilian Rothammer2, Cordt Zollfrank2, and Georg von Freymann1,3 — 1Physics Department and Research Center OPTIMAS, TU Kaiserslautern, Germany — 2Chair of Biogenic Polymers, TU Munich, Campus Straubing of Biotechnology and Sustainability, Germany — 3Institute for Industrial Mathematics ITWM, Germany
Direct laser writing is a common method for fabrication of three dimensional micro- and nanostructures. The available materials have recently been expanded to polysaccharides [1]. These resists consist of a photo-curable polysaccharide, a photo initiator and a solvent. The exact mixture defines the properties of the final material. A detailed discussion on the crosslinking density and hence the stability of the written structures as well as on the resolution and the feature size of the resist will be provided. These properties are most crucial for applications. Furthermore, we examine the surface roughness of the resist as well as the ability to self-assemble. The self-assembling of the resist is investigated with respect to the concentration of initiator. Different solvents are taken into account, to observe their influence on the handling of the resist. The knowledge about the influence of the exact mixture on the properties of the material allows the development of new resist for specific requierenments. This also allows the use of self-assembling processes for micro- and nanostructures with a tailored disorder.
[1] M. Rothammer et al., Cellulose 25, 6031 (2018).