Regensburg 2019 – scientific programme

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CPP: Fachverband Chemische Physik und Polymerphysik

CPP 4: Responsive and Adaptive Systems (joint session CPP/DY)

CPP 4.7: Talk

Monday, April 1, 2019, 11:00–11:15, H8

Reversible surface structuring of photosensitive polymer films: In-situ atomic force microscopy and diffraction efficiency measurements — •Joachim Jelken, Burkhard Stiller, Carsten Henkel, and Svetlana Santer — Institute of Physics and Astronomy, University of Potsdam, Potsdam, Germany

Here we report on light induced reversible structuring of azobenzene containing polymer films under dynamic changing of local distribution of electrical field vector in interference pattern used for the polymer irradiation. This is achieved utilizing a homemade setup which consists of three parts: a two beam interference setup for topography structuring, an atomic force microscope (AFM) for in-situ recording (during irradiation) of surface morphology[1,2], and a diffraction efficiency (DE) setup which enables to obtain information about the birefringence grating at the same time. Introducing a phase delay between the two interfering beams results in a shift of the whole interference pattern along the sample plane. Depending on the shifting speed the topography grating follows the redistribution of electrical field vector. In this way one can reversible structure and flatten surface topography in controlled manner. Using the measured kinetics of topography and birefringence gratings we aim to further understand the process of surface relief grating formation in azobenzene containing polymer films [3]. [1]S. N. Yadavalli, M. Saphiannikova and S. Santer, Appl. Phys. Lett., 2014, 105, 051601 [2]S. N. Yadavalli and S. Santer, J. of Appl. Phys., 2013, 113, 224304-12 [3]V. Toshchevikov, J. Ilnytskyi and M. Saphiannikova, J. Phys. Chem. Lett. 2017, 8, 1094