Regensburg 2019 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 14: Poster

DS 14.21: Poster

Dienstag, 2. April 2019, 17:00–20:00, Poster E

Ion-beam sputtering of tungsten oxide — •Mario Gies, Martin Becker, Fabian Michel, and Angelika Polity — Institute for Exp. Physics I and Center for Materials Research (LaMa), Justus Liebig University Giessen, Germany

Tungsten oxide films were prepared on glass substrates coated with fluorine-doped tin oxide (FTO) by ion-beam sputtering from a metallic tungsten target using different gas mixtures of argon and oxygen. The films were deposited at various growth temperatures between 100 and 400°C. The different growth temperatures allow the systematic adjustment of crystallinity between amorphous and polycrystalline tungsten oxide. At those temperatures a series of samples were created in which the oxygen flow rate was varied between 5 and 10 sccm. The results show that the choice of different oxygen flows during the deposition permits the creation of thin films with varying optical properties. Out of this, the various compositions of the films could be estimated. Besides those main series, hydrogen-doped films were deposited under the use of hydrogen as additional reactive gas during the sputtering process. All samples were investigated regarding different aspects like crystallinity, composition, morphology, optical properties and electrochromic behavior.