Regensburg 2019 – wissenschaftliches Programm
Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe
DS: Fachverband Dünne Schichten
DS 15: Focus Session: Direct-Write Nanofabrication and Applications I
(Electron Beam Induced Processing) (joint session DS/TT)
DS 15.1: Hauptvortrag
Mittwoch, 3. April 2019, 09:30–10:00, H32
3D-Nanoprinting with Focused Electron Beams. Advances and Applications — •Robert Winkler1, Jason D Fowlkes2,3,4, Jürgen Sattelkow1, Philip D Rack2,3,4, and Harald Plank1,5 — 1Christian Doppler Laboratory - DEFINE, Institute of Electron Microscopy, Graz University of Technology, 8010 Graz, Austria — 2Bredesen Center for Interdisciplinary Research, The University of Tennessee, Knoxville, 37996, USA — 3Nanofabrication Research Laboratory, Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, 37831, USA — 4Materials Science and Engineering Department, The University of Tennessee, Knoxville, 37996, USA — 5Graz Centre for Electron Microscopy, 8010 Graz, Austria
While 3D printing of objects down to the micrometer scale is well established, techniques for controlled additive manufacturing at the nanoscale are only few. Based on the progress in recent years, Focused Electron Beam Induced Deposition (FEBID) has evolved into a 3D nano-printing technology, allowing mask-less direct-write fabrication of complex 3D nano-architectures on almost any substrate. The growing availability of different precursor types expand the functionalities of those FEBID structures from electrically over magnetically towards optically active purposes, enabling applications, which have been very challenging in the past. Here, we introduce the technology and sketch possibilities and limitations for a comprehensive FEBID portfolio picture. We focus on recent advances in accuracy and predictability based on local heating effects and finally present selected applications of such 3D-nanoprinted structures in research and industry.