Regensburg 2019 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 15: Focus Session: Direct-Write Nanofabrication and Applications I
(Electron Beam Induced Processing) (joint session DS/TT)

DS 15.3: Vortrag

Mittwoch, 3. April 2019, 10:15–10:30, H32

On the reduction of proximity effects by exploring (metal-) organic materials as substrates/resists for gas-assisted electron beam lithography — Chrisatian Preischl, Elif Bilgilisoy, Florian Vollnhals, and •Hubertus Marbach — Physikalische Chemie II, FAU Erlangen-Nürnberg

We investigated organic and metal-organic materials as substrates/resists in different Focused Electron Beam Induced Processing (FEBIP) techniques. Here, FEBIP methods rely on the local decomposition of the volatile precursors Fe(CO)₅ and Co(CO)₃NO, by the direct impact of the focused electron beam (Electron Beam Induced Deposition, EBID) or through the interaction of the precursor with pre-irradiated/activated surface areas (Electron Beam Induced Surface Activation, EBISA).¹⁻³ The investigated materials range from porphyrin layers ^1,2 over surface anchored metal-organic frameworks (SURMOFs)³ to self-assembled monolayers (SAMs).⁴ Application of our surface science approach, i.e. working in an ultra-high vacuum environment, allows to obtain chemically well-defined deposits. A major advantage of the used materials are reduced electron proximity effects, i.e. reduced electron scattering and quenching of secondary electrons within the latter materials.¹⁻³ An illustrative example is the fabrication of test structures with Fe(CO)₅ on a SURMOF with an average line width value below 10 nm.³

[1] Marbach, H., Appl. Phys. A, 117 (2014) 987-995. [2] Drost, M., et al., Small methods, 1(2017)1700095. [3] Drost, M., et al., ACS Nano. 12 (2018) 3825 . [4] Turchanin, A., et al., Adv. Mater. 28 (2016) 6075.