DS 22: Thin Film Applications
Donnerstag, 4. April 2019, 09:30–12:15, H39
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09:30 |
DS 22.1 |
The contribution has been withdrawn.
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09:45 |
DS 22.2 |
Electrical and optical characterization of the correlated metals AMoO3 (A = Ca, Sr, Ba) — •Mahdad Mohammadi, Aldin Radetinac, Iliya Radulov, Leopold Diop, Philipp Komissinskiy, and Lambert Alff
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10:00 |
DS 22.3 |
Enhancing Performance of Sputter Deposited Photocatalytic Thin Films — Salih Veziroglu, Muhammad Zubair Ghori, Bodo Henkel, Alexander Vahl, Oleksandr Polonskyi, Thomas Strunskus, •Oral Cenk Aktas, and Franz Faupel
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10:15 |
DS 22.4 |
Novel deposition approach of MoS2 thin films for hydrogen evaluation reaction — •Talha Nisar, Torsten Balster, Francis Oliver Vinay Gomes, and Veit Wagner
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10:30 |
DS 22.5 |
Noise properties of oxygen engineered HfO2−x based Resistive Random Access Memory devices — •Eszter Piros, Martin Lonsky, Stefan Petzold, Eric Jalaguier, Emmanuel Nolot, Christelle Charpin, Jens Müller, and Lambert Alff
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10:45 |
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15 min. break.
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11:00 |
DS 22.6 |
High resolution fast X-ray reflectivity data acquisition — •Milena Lippmann, Anita Ehnes, and Oliver Seeck
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11:15 |
DS 22.7 |
The contribution has been withdrawn.
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11:30 |
DS 22.8 |
Microfabricated switchable THz flat lenses made out of VO2 thin films — •Florian Kuhl, Angelika Polity, Yan Zhang, and Peter J. Klar
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11:45 |
DS 22.9 |
Investigations of the physical properties of lithium-based solid electrolyte thin films in the system Li-P-S-O-N — •Fabian Michel, Martin Becker, Jürgen Janek, and Angelika Polity
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12:00 |
DS 22.10 |
The contribution has been withdrawn (duplicate of HL 4.3).
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