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DS: Fachverband Dünne Schichten

DS 22: Thin Film Applications

DS 22.3: Vortrag

Donnerstag, 4. April 2019, 10:00–10:15, H39

Enhancing Performance of Sputter Deposited Photocatalytic Thin Films — Salih Veziroglu, Muhammad Zubair Ghori, Bodo Henkel, Alexander Vahl, Oleksandr Polonskyi, Thomas Strunskus, •Oral Cenk Aktas, and Franz Faupel — Institute for Materials Science, Multicomponent Materials, Faculty of Engineering, Christian-Albrechts-University of Kiel, Kaiserstraβe 2, Kiel 24143, Germany

Semiconductor oxides such as TiO2, ZnO, etc. have been used in various photocatalytic processes including environmental remediation, energy harvesting, anti-bacterial and self-cleaning applications. Several methods including decorating metallic nanoparticles on such oxides and/or adding a second oxide (mixed oxide) have been developed to enhance the photocatalytic performance of such oxides. Most of these preparation methods are mainly based on wet-chemical techniques (solution-based). In comparison, physical vapour deposition methods offer solvent-free synthesis, high purity and precise control of amount of the added second phase (metallic nanoparticle or oxide). In this current work we present various approaches to enhance the performance of sputter deposited photocatalytic thin films. First a novel approach, which leads enlacing the affective surface area of sputter deposited photocatalytic thin films by inducing controlled nanocrack networks, will be presented. Then the use of cluster source to decorate photocatalytic thin films with metallic nanoparticles will be discussed. The plasmon induced photocatalysis will be covered briefly. Additionally, some case studies on photocatalytic mixed oxide thin films will be shown.