Regensburg 2019 – wissenschaftliches Programm

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HL: Fachverband Halbleiterphysik

HL 28: Diamond II (joint session KFM/HL)

HL 28.2: Vortrag

Mittwoch, 3. April 2019, 09:50–10:10, PHY 5.0.20

Fabrication of Photonic Crystals Based on Planarized Nanocrystalline Diamond Films — •Julia Heupel, Johann Peter Reithmaier, and Cyril Popov — Institute of Nanostructure Technologies and Analytics, Center for Interdisciplinary Nanostructure Science and Technology (CINSaT), University of Kassel, Heinrich-Plett-Str. 40, 34132 Kassel, Germany

Utilizing nanocrystalline diamond (NCD) membranes deposited on silicon dioxide/silicon substrates, two-dimensional photonic crystal slabs were fabricated. For adjusting the NCD film thickness as well as for smoothening the intrinsically rough surface, a planarization process was developed and investigated regarding the NCD surface roughness and overall thickness reduction. This procedure comprises the application and polymerization of spin-on glass (SOG), forming an even surface layer on NCD, followed by an inductively coupled plasma reactive ion etching (ICP RIE) step. The photonic crystal structures were prepared in NCD samples with a planarized surface by means of electron beam lithography (EBL) and ICP RIE. By underetching of the sacrificial silicon dioxide layer with a hydrofluoric acid solution, the photonic crystals were made suspended in air. The effect of the variation of the exposure dose factors on the air hole diameter and shape in the photonic hexagonal lattice was examined. Different established recipes for dry etching of the silicon dioxide hard mask were studied and analyzed.