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MM: Fachverband Metall- und Materialphysik
MM 20: Poster session II
MM 20.1: Poster
Dienstag, 2. April 2019, 18:30–20:00, Poster C
Tuning mechanical stress by nano-structure — •Philipp Klose1,2, Magnus Hamm1, Stefan Wagner2, and Astrid Pundt1,2 — 1Institut für Materialphysik, Georg-August-Universität Göttingen, Friedrich-Hund-Platz 1, 37077 Göttingen — 2Institut für angewandte Materialien IAM-WK, Karlsruher Institut für Technologie, Engelbert-Arnold-Straße 4, 76131 Karlsruhe
When materials are adhered to rigid substrates, the sorption of light elements can lead to high mechanical in-plane stress.[1,2] Linear elastic theory predicts stresses in the range of -10 GPa, for 1 Hydrogen atom in Niobium.[1,2] These stresses can lead to changes in the material's properties. For low element concentrations, the mechanical stress increases linearly by the element content. However, reduction in the stress increase appear at and above the yield stress.[3] Final stress of about -3 GPa are commonly measured. The final stress can be tuned by decreasing the film thickness. For Nb films below 6 nm, linear and reversible stress increase is maintained to 1 H/Nb and mechanical stress of about -10 GPa is actually measured.[4] The range of linear elasticity can be increased to about 80 nm film thickness, by varying the lateral domain size.[5,6] This will be done by a coherently matched second phase. This work is financially supported by the DFG via project PU131/12-1. [1] U. Laudahn et al., JALCOM (1999), [2] S. Wagner et al., Appl. Phys. Lett. 92 (2008), [3] A. Pundt et al., Phys. Rev. B 61.15 (2000), [4] Hamm, M., et al. APL 106 (2015), [5] P. Klose et al. IJHE (2017),[6] P. Klose et al., submitted.