Regensburg 2019 – scientific programme

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MM: Fachverband Metall- und Materialphysik

MM 35: Topical session (Symposium MM): Correlative and in-situ Microscopy in Materials Research

MM 35.4: Topical Talk

Thursday, April 4, 2019, 11:45–12:15, H45

In-situ Microscopy Testing of Metallic Thin Films — •Velimir Radmilović — University of Belgrade, Faculty of Technology and Metallurgy, Karnegijeva 4, 11120 Belgrade, Serbia — Serbian Academy of Sciences and Arts, Knez Mihailova 35, 11000 Belgrade, Serbia

Despite low ductility and wear resistance as well as poor fracture toughness, silicon and silicon-nitride (Si3N4) have been widely used in fabrication of micro-electromechanical (MEMS) and nano-electromechanical (NEMS) systems. Although metallic resonators tend to demonstrate considerably higher energy dissipation in the medium frequencies band, they have been proposed as a potential substitute for Si and Si3N4 devices since metallic films offer higher electrical conductivity and superior ductility. Resonant properties of nanocrystalline MEMS and NEMS metallic devices have been investigated by means of in-situ electron microscopy mechanical testing, using near-infrared laser interferometry. Mechanical testing is performed in tandem with shape modification and microstructural characterization by focused ion beam, scanning and transmission electron microscopy. Depending on alloy chemical composition and processing parameters, metallic films transform from pure crystalline to a unique microstructure with a dense distribution of nm-scale crystallites dispersed in an amorphous matrix. These films exhibit high nanoindentation hardness, metallic conductivity and tunable residual stresses, while surfaces display smooth morphology, characteristic for sputtered amorphous films.