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O: Fachverband Oberflächenphysik

O 35: 2D Materials I: Growth and Properties of Transition Metal Dichalcogenides, Phase Transitions

O 35.10: Vortrag

Dienstag, 2. April 2019, 16:15–16:30, H14

Nano-patterning of MoS₂ monolayers with focused ion beam — •Rajeshkumar Mupparapu¹, Michael Steinert¹, Antony George², Franz Löchner¹, Zian Tang², Tobias Bucher¹, Frank Setzpfandt¹, Andrey Turchanin², Thomas Pertsch¹, and Isabelle Staude¹ — ¹Institute of Applied Physics, Abbe Center of Photonics, Friedrich Schiller University Jena, Jena, Germany — ²Institute of Physical Chemistry, Friedrich Schiller University Jena, Jena, Germany

Monolayers of transition metal dichalcogenides (TMD-MLs) are immensely interesting for their versatile emission properties [1]. Typically, emission of these extremely thin materials is manipulated either by integrating them on to nanostructures or by assembling into heterostructures. Nano-patterning of TMD-MLs into desired shapes and sizes adds another degree of freedom for their emission manipulation [2, 3]. In this work, we report on nano-patterning of MoS₂ monolayers (MoS₂-MLs) with focused gallium-ion beam while minimizing the damage to the MoS₂ material. To investigate the influence of nano-patterning on emission properties of MoS₂-MLs, we performed photoluminescence, Raman and second harmonic generation measurements. References: [1]. Q. Wang et al., Nat. Nanotech., 7, 699-712 (2012). [2]. W. Guohua et al., Sci. Rep., 7, (2017). [3]. J. Yang et al., Light Sci. Appl., 5, e16046 (2016).