Regensburg 2019 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 64: Poster Wednesday: Plasmonics and Nanooptics

O 64.1: Poster

Mittwoch, 3. April 2019, 17:45–20:00, Poster B1

Photoemission electron microscopy using a 200 kHz high-order harmonic source — •Jan Vogelsang, Lukas Wittenbecher, Sara Mikaelsson, Chen Guo, Cord L Arnold, Anne L'Huillier, and Anders Mikkelsen — Department of Physics, Lund University, 221 00 Lund, Sweden

Ultrafast photoemission electron microscopy (PEEM) combines the high temporal resolution of short laser pulses with the high spatial resolution of electron microscopy. It elegantly circumvents the well-known problem of electron pulse dispersion by photoemitting and imaging electrons directly from a sample.

We developed an OPCPA laser system at 200 kHz repetition rate that drives the generation of high-order harmonics in an Ar gas jet. In combination with a spectral phase and amplitude pulse shaper, this system becomes a versatile tool to perform ultrafast PEEM experiments at a wide range of laser pulse energies and frequencies from the IR to the XUV.

We introduce the upgrade of the laser system driving high-order harmonic generation with a pulse energy of 10 to 15 uJ in the few-cycle regime. Additionally, first results of ultrafast PEEM experiments on both plasmonic and semiconductor nanostructures with varying dimensionality are shown.