Regensburg 2019 – scientific programme

Parts | Days | Selection | Search | Updates | Downloads | Help

O: Fachverband Oberflächenphysik

O 68: Poster Wednesday: Nanostructures

O 68.7: Poster

Wednesday, April 3, 2019, 17:45–20:00, Poster B2

An effective nanopatterning strategy for controllable fabrication of high-density sub-3-nm gaps — •Qun Fu^1,2, Huaping Zhao¹, and Yong Lei¹ — ¹Institut für Physik & IMN MacroNano (ZIK), Technische Universität Ilmenau, 98693, Ilmenau, Germany — ²Institute of Nanochemistry and Nanobiology, School of Environmental and Chemical Engineering, Shanghai University, Shanghai, 200444, China

The realization of large-scale high-density gaps with size as small as possible between neighboring nanostructures is crucial for designing ultrasensitive surface-enhanced Raman scattering substrates. As known, the ultra-thin alumina mask (UTAM) surface nanopatterning technique allows to fabricate large-scale (>1 cm2) ultrahigh-density (1010-1012 cm-2) 5-nm nanogaps in periodic nanostructure arrays. However, it is still difficult to realize reliable sub-5-nm gaps distribution on large area only by traditional one-step pore-widening process for UTAM technique, because of the collapse of the UTAM pore wall in the excessive pore-enlarge process at high operating temperature (30 C). Here, a two-step high-low temperature pore-widening process in the UTAM fabrication was reported as an efficient solution to precisely control the gap size into the range of sub-3-nm. This two-step pore-widening method enable to effectively avoid the fragmenting of the membrane and to obtain the large enough pore diameter to 97-99 nm steadily at appropriate lower temperature. As a result, large-scale nanoparticle arrays with high-density sub-3-nm gaps have been realized with the as-prepared UTAM as nanostructuring template.