Regensburg 2019 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 83: Organic Molecules on Inorganic Substrates VI: Chirality, Charge Transfer, Self-Assembly

O 83.8: Vortrag

Donnerstag, 4. April 2019, 17:00–17:15, H9

Adsorption Structure of Mono- and Diradicals on a Cu(111) Surface: Chemoselective Dehalogenation of 4-Bromo-3''-iodo-p-terphenyl — •Daniel Ebeling¹, Qigang Zhong², Tobias Schlöder³, Jalmar Tschakert¹, Pascal Henkel³, Sebastian Ahles⁴, Lifeng Chi², Doreen Mollenhauer³, Hermann A. Wegner⁴, and Andre Schirmeisen¹ — ¹Institute of Applied Physics, Justus Liebig University Giessen, Heinrich-Buff-Ring 16, 35392 Giessen, Germany — ²Institute of Functional Nano & Soft Materials (FUNSOM), Soochow University, 215123 Suzhou, P. R. China — ³Institute of Physical Chemistry, Justus Liebig University Giessen, Heinrich-Buff-Ring 17, 35392 Giessen, Germany — ⁴Institute of Organic Chemistry, Justus Liebig University Giessen, Heinrich-Buff-Ring 17, 35392 Giessen, Germany

For building molecular nanostructures on surfaces the knowledge about the precise adsorption geometry of intermediates at different stages during the reaction process and their interactions with surface atoms or adatoms is of fundamental importance. We show the selective dehalogenation of 4-bromo-3''-iodo-p-terphenyl on Cu(111) using bond imaging atomic force microscopy with CO functionalized tips. The deiodination and debromination reactions are triggered either by heating or locally applying voltage pulses with the tip. In connection with first principles simulations we can determine the orientation and position of the pristine molecules as well as adsorbed mono- and diradicals and the halogens. In particular, for the radicals we observe strongly twisted and bent 3D adsorption structures.