Regensburg 2019 – scientific programme
Parts | Days | Selection | Search | Updates | Downloads | Help
TT: Fachverband Tiefe Temperaturen
TT 39: Focus Session: Direct-Write Nanofabrication and Applications I
(Electron Beam Induced Processing) (joint session DS/TT)
TT 39.3: Talk
Wednesday, April 3, 2019, 10:15–10:30, H32
On the reduction of proximity effects by exploring (metal-) organic materials as substrates/resists for gas-assisted electron beam lithography — Chrisatian Preischl, Elif Bilgilisoy, Florian Vollnhals, and •Hubertus Marbach — Physikalische Chemie II, FAU Erlangen-Nürnberg
We investigated organic and metal-organic materials as substrates/resists in different Focused Electron Beam Induced Processing (FEBIP) techniques. Here, FEBIP methods rely on the local decomposition of the volatile precursors Fe(CO)5 and Co(CO)3NO, by the direct impact of the focused electron beam (Electron Beam Induced Deposition, EBID) or through the interaction of the precursor with pre-irradiated/activated surface areas (Electron Beam Induced Surface Activation, EBISA).1−3 The investigated materials range from porphyrin layers 1,2 over surface anchored metal-organic frameworks (SURMOFs)3 to self-assembled monolayers (SAMs).4 Application of our surface science approach, i.e. working in an ultra-high vacuum environment, allows to obtain chemically well-defined deposits. A major advantage of the used materials are reduced electron proximity effects, i.e. reduced electron scattering and quenching of secondary electrons within the latter materials.1−3 An illustrative example is the fabrication of test structures with Fe(CO)5 on a SURMOF with an average line width value below 10 nm.3
[1] Marbach, H., Appl. Phys. A, 117 (2014) 987-995. [2] Drost, M., et al., Small methods, 1(2017)1700095. [3] Drost, M., et al., ACS Nano. 12 (2018) 3825 . [4] Turchanin, A., et al., Adv. Mater. 28 (2016) 6075.