VA 2: Vacuum Metrology
Montag, 1. April 2019, 09:30–12:15, H6
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09:30 |
VA 2.1 |
Hauptvortrag:
Vacuum metrology and its impact on research and industry — •Karl Jousten and Matthias Bernien
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10:10 |
VA 2.2 |
Vacuum-compatible photon-counting hybrid pixel detector for WAXS, XRD and XRR in the tender X-ray range — •Dieter Skroblin, Levent Cibik, Benjamin Lüthi, Swenja Schreiber, Maximilian Luttkus, Alexander Schavkan, Mika Pflüger, and Michael Krumrey
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10:40 |
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15 min. break
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10:55 |
VA 2.3 |
Vacuum Pressure Measurement in Industrial Environments — •Martin Wüest
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11:25 |
VA 2.4 |
Absorption spectroscopy for process monitoring of technological plasmas — •Jürgen Röpcke, Mario Hannemann, Sarah-Johanna Klose, Norbert Lang, Alexander Puth, and Jean-Pierre H. van Helden
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11:55 |
VA 2.5 |
Nothing without vacuum! — •Ute Bergner
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