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VA: Fachverband Vakuumphysik und Vakuumtechnik

VA 2: Vacuum Metrology

VA 2.4: Vortrag

Montag, 1. April 2019, 11:25–11:55, H6

Absorption spectroscopy for process monitoring of technological plasmas — •Jürgen Röpcke, Mario Hannemann, Sarah-Johanna Klose, Norbert Lang, Alexander Puth, and Jean-Pierre H. van Helden — Leibniz Institute for Plasma Science and Technology, Greifswald, Germany

Mid infrared absorption spectroscopy (AS), based on quantum cascade lasers (QCLs) has progressed considerably as a powerful diagnostic technique for in situ studies of molecular plasmas. The increasing interest in processing plasmas containing molecular precursors has led to further applications of QCLAS because most of these compounds and their decomposition products are infrared active. QCLAS provides a means of determining the absolute concentrations of the ground states of stable and transient molecular species, which is of particular importance for the investigation of reaction kinetics. Since plasmas with molecular feed gases are used in many applications such as thin film deposition, semiconductor processing, surface activation and cleaning, and materials and waste treatment, this has stimulated the adaptation of infrared spectroscopic techniques to industrial requirements. The recent availability of frequency combs as new radiation sources for MIR-LAS will open up completely new options in process monitoring.