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Q: Fachverband Quantenoptik und Photonik
Q 30: Matter Wave Optics
Q 30.8: Vortrag
Mittwoch, 13. März 2019, 12:30–12:45, S SR 211 Maschb.
Spectroscopic Mueller Matrix Ellipsometry for Advanced Nanoform Metrology — •Tim Käseberg1, Johannes Dickmann1, Thomas Siefke2, Matthias Wurm1, Stefanie Kroker1,3, and Bernd Bodermann1 — 1Physikalisch-Technische Bundesanstalt, Bundesallee 100, 38116 Braunschweig, Germany — 2Friedrich-Schiller-Universität Jena, Institute of Applied Physics, Albert-Einstein-Straße 15, 07745 Jena, Germany — 3Technische Universität Braunschweig, LENA Laboratory for Emerging Nanometrology, Pockelsstraße 14, 38106 Braunschweig, Germany
The resolution of many optical imaging techniques is still limited to about half the wavelength of the incident light. To overcome this classical optical resolution limit, we investigate the use of structured illumination or patterned near-field manipulation in spectroscopic Mueller matrix ellipsometry to enhance the resolution of geometric features in off-diagonal Mueller matrix elements. In a first step, we designed resist nanostructures with variing geometries between 50 and 2000 nm on silicon substrate for measurements using a commercial ellipsometer. Additionally, we examine these structures numerically using the finite element tool JCMwave.