Dresden 2020 – scientific programme
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DS: Fachverband Dünne Schichten
DS 28: Poster: Thin Film Properties: Structure, Morphology and Composition
DS 28.16: Poster
Wednesday, March 18, 2020, 15:00–18:00, P1A
Comparison of surface preparation techniques for topological materials — AI Hamodi1, T Hökelek1, Yaser Hamodi2, O. Abdulkareem3, •Nami Nakamori4, Omar Isam2, N.Basheer Mahmood5, Karam Naji6, Ward Sheiko7, and Ali Jihad8 — 11Hacettepe University, Ankara, Turkey — 22Minstry of higher education and scientific research, Baghdad, Iraq — 33 Central Piedmont Community College, Texas, USA — 44Shanghai Institute of Ceramics, China — 55Ministry of education, Baghdad, Iraq — 66Lafargeholcim Company, France — 77Siemens Company, Oman — 88Thermoplastics company GmbH, Germany
The surface state of this type of material are heavily oxide at atmosphere pressure, to avoid the oxidation, grown of capping layer (Te or Se) is necessary directly after fowh of the films in ultra-high vacuum. Surface treatment can be classified in to i) Sputtering and annealing method which is really powerful technique for all type of materials ii) Top boost method, which is work only on some of these Topological material. Here we shows x-ray photoemission (XPS), low energy electron diffraction (LEED) and Angle-resolved photoemission spectroscopy (ARPES) results in detailed that prove our samples getting fresh surface after treatment. Additionally, we did overview surface treatment measurements for non-capped materials.