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DS: Fachverband Dünne Schichten

DS 31: Poster: Layer Deposition and Layer Properties

DS 31.2: Poster

Mittwoch, 18. März 2020, 15:00–18:00, P1A

Improvement of TiO₂ VO₂ multi-layers for application in thermochromic window-glazing — •Lukas Frommel, Martin Becker, Philip Klement, Florian Kuhl, Sebastian Benz, Jonas Hauptmann, Jörg Schörmann, and Sangam Chatterjee — Institute of Experimental Physics I and Center for Materials Research, Heinrich-Buff-Ring 16, Justus Liebig University Giessen, D-35392 Giessen, Germany

Thermochromic window glazing is a possible innovation to optimize the heat exchange in buildings. Vanadiumdioxid is a promising material for this application, because of a reversible insulator-to-metal transition at 68^∘C. To modify the characteristic temperature of this transition, a TiO₂ buffer layer can be used. While conventional preparation methods fail in terms of lateral upscaling, a new synthesis route for larger scales needs to be established.

Here, we prepare TiO₂ thin films by atomic layer deposition. Under variation of the process parameters, reactor temperature and precursor pulse times among others, different types and phases of TiO₂ are deposited and examined via X-Ray Reflectometry, Atomic Force Microscopy and Raman Spectroscopy. A VO₂ layer on top is prepared by rf-sputtering and the resulting multi-layer structure examined via UV-NIR Spectroscopy. The thickness and different structures of the TiO₂ buffer layer were found to significantly affect the switching properties of the VO₂.