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DS: Fachverband Dünne Schichten
DS 31: Poster: Layer Deposition and Layer Properties
DS 31.5: Poster
Mittwoch, 18. März 2020, 15:00–18:00, P1A
Exploring fragmentation processes in FXBID nanofabrication — •Andreas Späth1, Kim Thomann1, Benedikt Wolz1, Kevin C. Prince2, Robert Richter2, Wolfgang Hieringer3, and Rainer H. Fink1 — 1Physikalische Chemie II, FAU Erlangen-Nürnberg, Germany — 2Elettra Sincrotrone Trieste, Basovizza, Italy — 3Theoretische Chemie, FAU Erlangen-Nürnberg, Germany
Focused X-ray beam induced deposition (FXBID) is a novel technique for the additive fabrication of metallic nanostructures by illuminating metal organic precursor molecules with focused soft X-rays in a Fresnel zone plate based scanning transmission X-ray microscope (STXM) [1]. Fragmentation in FXBID is mainly caused by low-energy secondary electrons and, therefore, the fundamental processes of nanofabrication are very similar to such in electron beam induced deposition. However, FXBID provides tuning of deposition rate and potentially also fragment formation by variation of incident photon energy. For a detailed analysis of this aspect we have performed photon energy dependent mass spectrometry and secondary electron spectroscopy studies for several metal organic precursor molecules. The results are correlated with TD-DFT calculations of the molecular orbitals involved in soft X-ray absorption for a correlation of electron density localization and fragmentation. The project is funded by DFG grant SP 1775/1-1.
[1] A. Späth, Micromachines, 2019, 10, 834.