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DS: Fachverband Dünne Schichten

DS 31: Poster: Layer Deposition and Layer Properties

DS 31.5: Poster

Mittwoch, 18. März 2020, 15:00–18:00, P1A

Exploring fragmentation processes in FXBID nanofabrication — •Andreas Späth¹, Kim Thomann¹, Benedikt Wolz¹, Kevin C. Prince², Robert Richter², Wolfgang Hieringer³, and Rainer H. Fink¹ — ¹Physikalische Chemie II, FAU Erlangen-Nürnberg, Germany — ²Elettra Sincrotrone Trieste, Basovizza, Italy — ³Theoretische Chemie, FAU Erlangen-Nürnberg, Germany

Focused X-ray beam induced deposition (FXBID) is a novel technique for the additive fabrication of metallic nanostructures by illuminating metal organic precursor molecules with focused soft X-rays in a Fresnel zone plate based scanning transmission X-ray microscope (STXM) [1]. Fragmentation in FXBID is mainly caused by low-energy secondary electrons and, therefore, the fundamental processes of nanofabrication are very similar to such in electron beam induced deposition. However, FXBID provides tuning of deposition rate and potentially also fragment formation by variation of incident photon energy. For a detailed analysis of this aspect we have performed photon energy dependent mass spectrometry and secondary electron spectroscopy studies for several metal organic precursor molecules. The results are correlated with TD-DFT calculations of the molecular orbitals involved in soft X-ray absorption for a correlation of electron density localization and fragmentation. The project is funded by DFG grant SP 1775/1-1.

[1] A. Späth, Micromachines, 2019, 10, 834.