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DS: Fachverband Dünne Schichten

DS 6: Thin Film Applications II

DS 6.5: Vortrag

Montag, 16. März 2020, 11:45–12:00, CHE 91

Sputter deposition of tungsten oxide and study of its electrochromic behavior for various electrolytes — •Mario Gies, Martin Becker, Fabian Michel, and Angelika Polity — Institute of Exp. Physics I and Center for Materials Research (LaMa), Justus Liebig University Giessen, Germany.

In this work, tungsten oxide films were prepared by means of various types of the sputter deposition, i.e. ion-beam and radio-frequency (rf)-sputter deposition. The focus was on optimizing the layers especially for use as a component in an electrochromic device. Layers were deposited from a metallic tungsten target under various gas mixtures of argon, oxygen and additional hydrogen. The choice of different gas mixtures allows to tune the optical characteristics of the synthesized films. Glass coated with fluorine-doped tin oxide (FTO) was used as substrate in order to establish an electrical contact for electrochemical measurements. The as-grown rf-sputtered layers were found to be amorphous. Ion-beam sputtered films were deposited under ambient as well as elevated growth temperatures. As a consequence, in addition to amorphous samples, crystalline films were grown. The different layers were investigated on the basis of their structural and compositional characteristics. Finally, the electrochromic properties of selected samples were examined in electrochemical measurements using different electrolytes.